04/28/2005 • Image processing / Optical metrology

Semiconductor Inspection Microscope

The Olympus MX61 will improve inspection by enabling an increased failure detection rate with more reliable inspection results. This is achieved through automatically optimised contrast for any desired magnification and easy access to sophisticated contrast mehtods. In addition, an intuitive operation concept minimises errors and reduces the variation of results between operators to a minimum. The total development concept had been focused on maximising the efficiency of the inspection. The small footprint and slim design of the microscope make it easy to design workplaces that are cost effective and practical. The slim frame design reduces the transfer distance from wafer handling systems to the microscope stage.
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