Plasma Cleaning System

The Evactron EP Remote Plasma Source uses flowing afterglow cleaning with air to clean carbon compounds from vacuum chambers operating with turbomolecular pumps.

The new system has instant ignition from any vacuum level. It uses a low wattage hollow cathode electrode to produce plasma. It is compact and affordable. Evactron systems were specifically designed for cleaning electron microscopes safely. Their high rate process cleans in minutes removing carbon acquired during exposure to ambient air, system assembly, poor vacuum practice, etc.

The removal of carbon speeds pump down times improving instrument performance and stops carbon deposition by lasers and charged particle beams on optics and other sensitive surfaces.