The Verios XHR SEM von FEI provides the sub-nanometer resolution and enhanced contrast needed for precise measurements on beam-sensitive materials in advanced semiconductor manufacturing and materials science applications.
At low kV the Verios system’s advanced optics deliver sensitivity to surface detail. It allows any user to switch quickly between various operating conditions, maintain sample cleanliness, and obtain sub-nanometer resolution at any accelerating voltage from 1 kV to 30 kV. In accordance to its new detection technologies, many beam-sensitive or non-conductive materials can now be accurately observed at the nanoscale, without any preparation.