EMC 2008 provides the first European showing of the new SU8000 high resolution semi-in-lens field emission scanning electron microscope (FESEM). The SU8000 joins the S-5500 and S-4800 in Hitachis portfolio of high performance FESEMs. The SU8000 is particularly suited to imaging of new and innovative nanotechnology materials and features a triple detection system along with a semi-in-lens type of objective lens to maximise surface and sub-surface information provided by the secondary and backscattered electron signals. A new top detector is a further advance on the popular upper backscattered electron detector used in the S-5500.